Paper 2024/1149 Original: eprint.iacr.org/2024/1149 ↗
Improved High-Order Masked Generation of Masking Vector and Rejection Sampling in Dilithium
Abstract
In this work, we introduce enhanced high-order masking techniques tailored for Dilithium, the post-quantum signature scheme recently standardized by NIST. We improve the masked generation of the masking vector $\vec{y}$, based on a fast Boolean-to-arithmetic conversion modulo $q$. We also describe an optimized gadget for the high-order masked rejection sampling, with a complexity independent from the size of the modulus $q$. We prove the security of our gadgets in the classical ISW $t$-probing model. Finally, we detail our open-source C implementation of these gadgets integrated into a fully masked Dilithium implementation, and provide an efficiency comparison with previous works.
Metadata
- Available format(s)
PDF- Category
- Implementation
- Publication info
- Preprint.
- History
- 2024-11-06: last updated
- 2024-07-15: published
- Short URL
- https://ia.cr/2024/1149
- License
- https://creativecommons.org/licenses/by/4.0/
BibTeX
@misc{cryptoeprint:2024/1149,
author = {Jean-Sébastien Coron and François Gérard and Tancrède Lepoint and Matthias Trannoy and Rina Zeitoun},
title = {Improved High-Order Masked Generation of Masking Vector and Rejection Sampling in Dilithium},
howpublished = {Cryptology {ePrint} Archive, Paper 2024/1149},
year = {2024},
url = {https://eprint.iacr.org/2024/1149}
}